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Materials Science-Poland
Volume 36 (2018): Issue 1 (March 2018)
Open Access
Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide
Witold Posadowski
Witold Posadowski
,
Artur Wiatrowski
Artur Wiatrowski
and
Grzegorz Kapka
Grzegorz Kapka
| May 18, 2018
Materials Science-Poland
Volume 36 (2018): Issue 1 (March 2018)
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Published Online:
May 18, 2018
Page range:
69 - 74
Received:
Mar 24, 2017
Accepted:
Oct 11, 2017
DOI:
https://doi.org/10.1515/msp-2017-0092
Keywords
pulsed magnetron sputtering
,
thin film
,
deposition
,
nickel
,
nickel oxide
© 2018
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.