<abstract xmlns="http://www.w3.org/1999/xhtml"><p>The paper presents results of investigations on surface properties of transparent semiconducting thin films based on (Ti-Cu)oxide system prepared using multi-magnetron sputtering system. The thin films were prepared using two programmed profiles of pulse width modulation coefficient, so called V- and U-shape profiles. The applied powering profiles allowed fabrication of thin films with gradient distribution of Ti and Cu elements over the thickness of deposited layers. Optical investigations allowed determination of transparency of prepared films that reached up to 60 % in the visible part of optical radiation, which makes them attractive for the transparent electronics domain. Surface properties investigations showed that the surface of mixed (Ti-Cu)oxides was sensitive to adsorption, in particular to carbon dioxide and water vapor. Soft etching with argon ions resulted in surface cleaning from residuals, however, deoxidation of Cu-oxide components was also observed.</p></abstract>

The paper presents results of investigations on surface properties of transparent semiconducting thin films based on (Ti-Cu)oxide system prepared using multi-magnetron sputtering system. The thin films were prepared using two programmed profiles of pulse width modulation coefficient, so called V- and U-shape profiles. The applied powering profiles allowed fabrication of thin films with gradient distribution of Ti and Cu elements over the thickness of deposited layers. Optical investigations allowed determination of transparency of prepared films that reached up to 60 % in the visible part of optical radiation, which makes them attractive for the transparent electronics domain. Surface properties investigations showed that the surface of mixed (Ti-Cu)oxides was sensitive to adsorption, in particular to carbon dioxide and water vapor. Soft etching with argon ions resulted in surface cleaning from residuals, however, deoxidation of Cu-oxide components was also observed.

Analysis of surface properties of Ti-Cu-Ox gradient thin films using AFM and XPS investigations

Faculty of Microsystem Electronics and Photonics

Wroclaw University of Science and Technology

Department of Material Science and Diagnostics, Electrotechnical Institute

Applied Physics-Sensor Technology, Brandenburg

University of Technology Cottbus-Senftenberg

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

The paper presents results of investigations on surface properties of transparent semiconducting thin films based on (Ti-Cu)oxide system prepared using...

Analysis of surface properties of Ti-Cu-Ox gradient thin films using AFM and XPS investigations

Publicado en línea: 01 feb 2019

Páginas: 761 - 768

Recibido: 09 nov 2018

Aceptado: 30 nov 2018

DOI: https://doi.org/10.2478/msp-2018-0100

Palabras clave
surface, gradient distribution, thin film oxide

© 2018 Tomasz Kotwica et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Analysis of surface properties of Ti-Cu-Ox gradient thin films using AFM and XPS investigations

Publicado en línea: 01 feb 2019

Páginas: 761 - 768

Recibido: 09 nov 2018

Aceptado: 30 nov 2018

DOI: https://doi.org/10.2478/msp-2018-0100

Palabras clavesurface, gradient distribution, thin film oxide

© 2018 Tomasz Kotwica et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Palabras clave
surface, gradient distribution, thin film oxide