Influence of magnetron powering mode on various properties of TiO₂ thin films

In this paper, comparative studies on the structural, surface, optical, mechanical and corrosion properties of titanium dioxide (TiO₂) thin films deposited by continuous and sequential magnetron sputtering processes were presented. In case of continuous process, magnetron was continuously supplied with voltage for 90 min. In turn, in sequential process, the voltage was supplied for 1 s alternately with 1 s break, therefore, the total time of the process was extended to 180 min. The TiO₂ thin films were crack free, exhibited good adherence to the substrate and the surface morphology was homogeneous. Structural analysis showed that there were no major differences in the microstructure between coatings deposited in continuous and sequential processes. Both films exhibited nanocrystalline anatase structure with crystallite sizes of ca. 21 nm. Deposited coatings had high transparency in the visible wavelength range. Significant differences were observed in porosity (lower for sequential process), scratch resistance (better for sequential process), mechanical performance, i.e. hardness:elastic modulus ratio (higher for sequential process) and corrosion resistance (better for sequential process).