<abstract xmlns="http://www.w3.org/1999/xhtml"><p>This work investigates the influence of titanium thin films on the mechanical properties of AA 2024 substrates. The Scanning Electron Microscope (SEM) measurements confirm that the surface morphology of Ti thin film depends on controlled deposition rate and the energy-dispersive X-ray (EDX) result reveals the uniform dispersion of Ti coating over the sample. Increase in film thickness on the material surface is connected with improved hardness, superior adhesion and minimum surface roughness which makes the coated material more prominent for MEMS application. It is also found that the XRD patterns of the Ti thin films are characterized by hexagonal close packed (HCP) structure with (1 1 1) as the preferred crystallographic orientation for the film of a thickness of 154 μm coated on the substrate at temperature of 673 K.</p></abstract>

This work investigates the influence of titanium thin films on the mechanical properties of AA 2024 substrates. The Scanning Electron Microscope (SEM) measurements confirm that the surface morphology of Ti thin film depends on controlled deposition rate and the energy-dispersive X-ray (EDX) result reveals the uniform dispersion of Ti coating over the sample. Increase in film thickness on the material surface is connected with improved hardness, superior adhesion and minimum surface roughness which makes the coated material more prominent for MEMS application. It is also found that the XRD patterns of the Ti thin films are characterized by hexagonal close packed (HCP) structure with (1 1 1) as the preferred crystallographic orientation for the film of a thickness of 154 μm coated on the substrate at temperature of 673 K.

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Department of Mechanical Engineering, N.G.P. Institute of Technology, Coimbatore-641048, Tamil Nadu,

Department of Mechanical Engineering, PSG College of Technology, Coimbatore-641004, Tamil Nadu,

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

This work investigates the influence of titanium thin films on the mechanical properties of AA 2024 substrates. The Scanning Electron Microscope (SEM)...

Sample	Deposition time [s]	Temperature [K]	Film thickness [μm]
S0 (uncoated sample)	–	–	–
S1	180	373	45
S2	300	473	60
S3	420	573	86
S4	900	673	153

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Published Online: Nov 19, 2016

Page range: 735 - 740

Received: Dec 14, 2015

Accepted: Aug 29, 2016

DOI: https://doi.org/10.1515/msp-2016-0099

Keywords
titanium, thin films, sputtering, hardness, MEMS

© Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Film thickness of samples S0, S1, S2, S3 and S4 for different deposition times and temperatures.

Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application

Published Online: Nov 19, 2016

Page range: 735 - 740

Received: Dec 14, 2015

Accepted: Aug 29, 2016

DOI: https://doi.org/10.1515/msp-2016-0099

Keywordstitanium, thin films, sputtering, hardness, MEMS

© Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Film thickness of samples S0, S1, S2, S3 and S4 for different deposition times and temperatures.

Keywords
titanium, thin films, sputtering, hardness, MEMS