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Materials Science-Poland
Volume 34 (2016): Issue 4 (December 2016)
Open Access
Influence of controlled deposition rate on mechanical properties of sputtered Ti thin films for MEMS application
S. Venkatesan
S. Venkatesan
and
M. Ramu
M. Ramu
| Nov 19, 2016
Materials Science-Poland
Volume 34 (2016): Issue 4 (December 2016)
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Published Online:
Nov 19, 2016
Page range:
735 - 740
Received:
Dec 14, 2015
Accepted:
Aug 29, 2016
DOI:
https://doi.org/10.1515/msp-2016-0099
Keywords
titanium
,
thin films
,
sputtering
,
hardness
,
MEMS
© Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.