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Journals
Materials Science-Poland
Volume 33 (2015): Issue 4 (December 2015)
Open Access
Methods of optimization of reactive sputtering conditions of Al target during AlN films deposition
Rafal Chodun
Rafal Chodun
,
Katarzyna Nowakowska-Langier
Katarzyna Nowakowska-Langier
and
Krzysztof Zdunek
Krzysztof Zdunek
| Jan 06, 2016
Materials Science-Poland
Volume 33 (2015): Issue 4 (December 2015)
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Published Online:
Jan 06, 2016
Page range:
894 - 901
Received:
May 31, 2015
Accepted:
Oct 05, 2015
DOI:
https://doi.org/10.1515/msp-2015-0116
Keywords
OES
,
AlN films
,
nanocrystalline films
,
magnetron sputtering
© 2015 Rafal Chodun et al., published by De Gruyter Open
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Rafal Chodun
Faculty of Materials Science and Engineering Warsaw University of Technology
Warsaw, Poland
Katarzyna Nowakowska-Langier
National Centre for Nuclear Research (NCBJ)
Otwock-Swierk, Poland
Krzysztof Zdunek
Faculty of Materials Science and Engineering Warsaw University of Technology
Warsaw, Poland