<abstract xmlns="http://www.w3.org/1999/xhtml"><p>The research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard unbalanced circular magnetron was conducted in the process of pulsed magnetron sputtering (PMS). It was shown that by using different levels of modulation, the composition of plasma (measured by optical emission spectroscopy, OES) as well as film growth rate and morphology (observed with scanning electron microscope, SEM), can be changed. The impact of modulation is related to the used materials and gases and can vary significantly. It was concluded that modulation frequency can greatly influence the synthesis of materials and can be used as an additional parameter in PMS. Specific relations between modulation frequency and synthesized material require further investigation.</p></abstract>

The research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard unbalanced circular magnetron was conducted in the process of pulsed magnetron sputtering (PMS). It was shown that by using different levels of modulation, the composition of plasma (measured by optical emission spectroscopy, OES) as well as film growth rate and morphology (observed with scanning electron microscope, SEM), can be changed. The impact of modulation is related to the used materials and gases and can vary significantly. It was concluded that modulation frequency can greatly influence the synthesis of materials and can be used as an additional parameter in PMS. Specific relations between modulation frequency and synthesized material require further investigation.

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Faculty of Materials Science and Engineering

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

The research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard...

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Pubblicato online: 01 feb 2019

Pagine: 697 - 703

Ricevuto: 29 nov 2017

Accettato: 16 lug 2018

DOI: https://doi.org/10.2478/msp-2018-0078

Parole chiave
pulsed magnetron sputtering, pulse plasma, modulation frequency, metallic films, ceramic films

© 2018 G.W. Strzelecki et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Pubblicato online: 01 feb 2019

Pagine: 697 - 703

Ricevuto: 29 nov 2017

Accettato: 16 lug 2018

DOI: https://doi.org/10.2478/msp-2018-0078

Parole chiavepulsed magnetron sputtering, pulse plasma, modulation frequency, metallic films, ceramic films

© 2018 G.W. Strzelecki et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Parole chiave
pulsed magnetron sputtering, pulse plasma, modulation frequency, metallic films, ceramic films