<abstract xmlns="http://www.w3.org/1999/xhtml">TiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS) technique. The influence of the filtering electrode mesh number on the structure and optical properties of TiO2 thin films was investigated. The structure, surface morphology and optical properties were characterized by XRD, SEM and ellipsometric spectroscopy, respectively. Results show that the TiO2 thin films deposited by the DMS and EFMS techniques at the same deposition parameters are composed of the anatase phase exclusively. TiO2 thin films deposited at lower deposition rate by the EFMS technique have lower crystallinity, smaller particle size and smoother surface. With increasing the mesh number, the refractive index, extinction coefficient and optical band gap are larger.</abstract>

TiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS) technique. The influence of the filtering electrode mesh number on the structure and optical properties of TiO2 thin films was investigated. The structure, surface morphology and optical properties were characterized by XRD, SEM and ellipsometric spectroscopy, respectively. Results show that the TiO2 thin films deposited by the DMS and EFMS techniques at the same deposition parameters are composed of the anatase phase exclusively. TiO2 thin films deposited at lower deposition rate by the EFMS technique have lower crystallinity, smaller particle size and smoother surface. With increasing the mesh number, the refractive index, extinction coefficient and optical band gap are larger.

Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique

Departments of Mathematics and Information Science

North China University of Water Resources and Electric Power

School of Physical Engineering and Laboratory of Material Physics

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Research on the influence of the filtrating electrode on the structure and optical properties of TiO thin films prepared by the energy filtering magnetron sputtering technique

TiO2 thin films were deposited by the energy filtrating magnetron sputtering (EFMS) technique and the traditional direct current magnetron sputtering (DMS)...

Research on the influence of the filtrating electrode on the structure and optical properties of TiO₂ thin films prepared by the energy filtering magnetron sputtering technique

Online veröffentlicht: 08. Mai 2020

Seitenbereich: 1 - 7

Eingereicht: 21. Nov. 2016

Akzeptiert: 23. Apr. 2018

DOI: https://doi.org/10.2478/msp-2019-0082

Schlüsselwörter
energy filtering magnetron sputtering, TiO thin film, optical property

© 2020 Zhaoyong Wang et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Research on the influence of the filtrating electrode on the structure and optical properties of TiO2 thin films prepared by the energy filtering magnetron sputtering technique

Online veröffentlicht: 08. Mai 2020

Seitenbereich: 1 - 7

Eingereicht: 21. Nov. 2016

Akzeptiert: 23. Apr. 2018

DOI: https://doi.org/10.2478/msp-2019-0082

Schlüsselwörterenergy filtering magnetron sputtering, TiO thin film, optical property

© 2020 Zhaoyong Wang et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Research on the influence of the filtrating electrode on the structure and optical properties of TiO₂ thin films prepared by the energy filtering magnetron sputtering technique

Schlüsselwörter
energy filtering magnetron sputtering, TiO thin film, optical property