<abstract xmlns="http://www.w3.org/1999/xhtml">ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%.</abstract>

ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%.

A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

Centre de Développement des Technologies Avancées, CDTA

Journal of Electrical Engineering

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

A study of properties of ZrO thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

ZrO2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas...

A study of properties of ZrO₂ thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

Online veröffentlicht: 28. Sept. 2019

Seitenbereich: 117 - 121

Eingereicht: 19. März 2019

DOI: https://doi.org/10.2478/jee-2019-0052

Schlüsselwörter
ZrO, magnetron sputtering, thin films, hardness, corrosion

© 2019 Hind Zegtouf et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

Online veröffentlicht: 28. Sept. 2019

Seitenbereich: 117 - 121

Eingereicht: 19. März 2019

DOI: https://doi.org/10.2478/jee-2019-0052

SchlüsselwörterZrO, magnetron sputtering, thin films, hardness, corrosion

© 2019 Hind Zegtouf et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

A study of properties of ZrO₂ thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

Schlüsselwörter
ZrO, magnetron sputtering, thin films, hardness, corrosion