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Materials Science-Poland
Volume 32 (2014): Issue 3 (September 2014)
Open Access
Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering
Michal Mazur
Michal Mazur
,
Danuta Kaczmarek
Danuta Kaczmarek
,
Eugeniusz Prociow
Eugeniusz Prociow
,
Jaroslaw Domaradzki
Jaroslaw Domaradzki
,
Damian Wojcieszak
Damian Wojcieszak
and
Jakub Bocheński
Jakub Bocheński
| Oct 17, 2014
Materials Science-Poland
Volume 32 (2014): Issue 3 (September 2014)
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Published Online:
Oct 17, 2014
Page range:
457 - 464
DOI:
https://doi.org/10.2478/s13536-013-0195-4
Keywords
(Ti,Nb)Ox thin films
,
transparent oxide semiconductor
,
p-type electrical conduction
,
niobium doped titanium dioxide
,
transparent electronics
© 2014 Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Michal Mazur
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
Danuta Kaczmarek
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
Eugeniusz Prociow
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
Jaroslaw Domaradzki
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
Damian Wojcieszak
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland
Jakub Bocheński
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372, Wroclaw, Poland