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Materials Science-Poland
Volume 30 (2012): Issue 4 (December 2012)
Open Access
Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process
K. Tadaszak
K. Tadaszak
,
K. Nitsch
K. Nitsch
,
T. Piasecki
T. Piasecki
and
W. Posadowski
W. Posadowski
| Dec 14, 2012
Materials Science-Poland
Volume 30 (2012): Issue 4 (December 2012)
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Published Online:
Dec 14, 2012
Page range:
323 - 328
DOI:
https://doi.org/10.2478/s13536-012-0058-4
Keywords
impedance spectroscopy
,
aluminium oxide
,
reactive magnetron sputtering
© 2012 Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.