A study of properties of ZrO₂ thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application

[1] G. Manivasagam, D. Dhinasekaran, A. Rajamanickam, “Biomedical Implants: Corrosion and its Prevention-A Review”, Recent Patents on Corrosion Science, vol. 2, pp. 40–54, 2010.10.2174/1877610801002010040Search in Google Scholar

[2] L. Bait, L. Azouz, N. Madaoui, N. Saoula, “Influence of substrate bias voltage on the properties of TiO₂ deposited by radio-frequency magnetron sputtering on 304L for biomaterials applications”, Applied Surface Science, vol. 72, pp. 395–397, 2017.10.1016/j.apsusc.2016.07.101Search in Google Scholar

[3] K. Wheeler, L. James, “Fatigue behavior of type 316 stainless steel under simulated body conditions”, Journal of Biomedical Materials Research Part A, vol. 267, pp. 81–85, 1971.10.1002/jbm.820050313Search in Google Scholar

[4] V. Vancoppenolle, P.-Y. Jouan, A. Ricard, M. Wautelet, J.-P. Dauchot, M. Hecq, “Oxygen active species in an Ar - O₂ magnetron discharge for titanium oxide deposition”, Applied Surface Science, vol. 249, pp. 205–255, 2003.10.1016/S0169-4332(02)01085-1Search in Google Scholar

[5] N. Li, M. Suzuki, Y. Abe, M. Kawamura, K. Sasaki, H. Itoh, et al, “Effects of substrate temperature on the ion conductivity of hydrated ZrO₂ thin films prepared by reactive sputtering in H₂O atmosphere”, Solar Energy Materials and Solar Cells, vol. 160, pp. 95–99, 2012.10.1016/j.solmat.2011.03.037Search in Google Scholar

[6] J. Vlček, J. Rezek, J. Houška, R. Čerstvý, R. Bugyi, “Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO₂ and Ta₂O₅ films”, Surface and Coatings Technology, vol. 236, pp. 550–556, 2013.10.1016/j.surfcoat.2013.10.052Search in Google Scholar

[7] S. Zhao, F. Ma, K. Xu, H. Liang, “Optical properties and structural characterization of bias sputtered ZrO2 films”, Journal of Alloys and Compounds, vol. 453, pp. 453–457, 2008.10.1016/j.jallcom.2006.11.134Search in Google Scholar

[8] W. C. Oliver, G. M. Pharr, “An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments”, Journal of materials research, vol. 7, pp. 1564–1583, 1992.Search in Google Scholar

[9] M. Wong, W. Chia, J. Schneider, P. Yashar, W. Sproul, S. Barnett, “High-Rate Reactive DC Magnetron Sputtering of ZrO_x “, Surface and Coatings Technology, vol. 86-87, pp. 381–387, 1996.10.1016/S0257-8972(96)03038-1Search in Google Scholar

[10] A. Thaveedeetrakul, N. Witit-anun, V. Boonamnuayvitaya, “The role of target-to-substrate distance on the DC magnetron sputtered zirconia thin films bioactivity”, Applied Surface Science, vol. 258, pp. 2612–2619, 2012.Search in Google Scholar

[11] Z. Ji, J. Haynes, M. Ferber, J. Rigsbee, “Metastable tetragonal zirconia formation and transformation in reactively sputter deposited zirconia coatings”, Surface and Coatings Technology, vol. 135, pp. 109–117, 2001.10.1016/S0257-8972(00)00910-5Search in Google Scholar

[12] J. Park, J. K. Heo, Y.-C. Kang, “The properties of RF sputtered zirconium oxide thin films at different plasma gas ratio”, Bull Korean Chem Soc., vol. 31, pp. 397, 2010.10.5012/bkcs.2010.31.02.397Search in Google Scholar

[13] C. Ma, F. Lapostolle, P. Briois, Q. Zhang, “Effect of O₂ gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO₂ thin films”, Applied surface science, vol. 253, pp. 8718–8724, 2007.Search in Google Scholar

[14] P. Kondaiah, S. Uthanna, G. M. Rao, “Substrate bias voltage influence on structural, electronic and dielectric properties of ZrO₂ gate dielectrics”, Nanoscience, Engineering and Technology (ICONSET), International Conference on: IEEE, pp. 616–619, 2011.10.1109/ICONSET.2011.6168046Search in Google Scholar

[15] D. Joslin, W. Oliver, “A new method for analyzing data from continuous depth-sensing microindentation tests”, Journal of Materials Research, vol. 5, pp. 123–126, 1990.10.1557/JMR.1990.0123Search in Google Scholar

[16] T. Tsui, G. Pharr, W. Oliver, C. Bhatia, R. White, S. Anders, et al, “Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks”, MRS Online Proceedings Library Archive, vol. 383, 1995.10.1557/PROC-383-447Search in Google Scholar

[17] N. Savvides, T. Bell, “Hardness and elastic modulus of diamond and diamond-like carbon films”, Thin Solid Films, vol. 228, pp. 289–292, 1993.10.1016/0040-6090(93)90618-YSearch in Google Scholar

[18] T.-H. Fang, S.-R. Jian, D.-S. Chuu, “Nanomechanical properties of TiC, TiN and TiCN thin films using scanning probe microscopy and nanoindentation”, Applied Surface Science, vol. 228, pp. 365–372, 2004.10.1016/j.apsusc.2004.01.053Search in Google Scholar

[19] Z. Wu, X. Tian, Z. Wang, C. Gong, S. Yang, CM. Tan, et al, “Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition”, Applied Surface Science, vol. 258, pp. 242–246, 2011.10.1016/j.apsusc.2011.08.039Search in Google Scholar

[20] E. McCafferty, “Validation of corrosion rates measured by the Tafel extrapolation method”, Corrosion Science, vol. 47, pp. 3202–3215, 2005.Search in Google Scholar

[21] R. Kotoka, S. Yarmolenko, D. Pai, J. Sankar, “Corrosion Behavior of Reactive Sputtered Al₂O₃ and ZrO₂ Thin Films on Mg Disk Immersed in Saline Solution”, Journal of Materials Science & Technology, vol. 31, pp. 873–880, 2015.10.1016/j.jmst.2015.07.020Search in Google Scholar