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(a) Horizontal derivatives of a KBr(1 0 0) surface just after crystal cleaving; AFM in-the-air imaging, (b) the area of the square 6.1 × 6.1 pm2 marked with the dashed line in (a).
(a) Horizontal derivatives of a KBr(1 0 0) surface just after crystal cleaving; AFM in-the-air imaging, (b) the area of the square 6.1 × 6.1 pm2 marked with the dashed line in (a).

Evolution of the etch pit versus exposure to a weak isopropanol solution of water. Exposure time in minutes is given in the upper right corner of each image. Area of scan is 9.0 × 9.0 µm2. Z scales of images (a-e) are described from dark (0 nm) to light 38, 39, 32, 36 and 25 nm, respectively.
Evolution of the etch pit versus exposure to a weak isopropanol solution of water. Exposure time in minutes is given in the upper right corner of each image. Area of scan is 9.0 × 9.0 µm2. Z scales of images (a-e) are described from dark (0 nm) to light 38, 39, 32, 36 and 25 nm, respectively.

Hollow profiles along directions (a) [0 1 0] and (b) [1 1 0] for various times of exposure to the solution. Inset in (a) shows crystallographic directions of the hollow.
Hollow profiles along directions (a) [0 1 0] and (b) [1 1 0] for various times of exposure to the solution. Inset in (a) shows crystallographic directions of the hollow.

(a) Number of atomic steps and (b) base side width of the etched hollow as a function of time along 〈1 1 0〈 and 〈1 0 0〉 directions.
(a) Number of atomic steps and (b) base side width of the etched hollow as a function of time along 〈1 1 0〈 and 〈1 0 0〉 directions.

Density of atomic steps as a function of time along 〈1 1 0〉 and 〈1 0 0〉 directions.
Density of atomic steps as a function of time along 〈1 1 0〉 and 〈1 0 0〉 directions.

Influence of tip scanning on the shape of a hollow. Profiles along [1 1 0] and [1 1 0] directions were observed in 203 minutes of exposure to the solution.
Influence of tip scanning on the shape of a hollow. Profiles along [1 1 0] and [1 1 0] directions were observed in 203 minutes of exposure to the solution.
eISSN:
2083-134X
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties