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Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
Open Access
Controlled fluoridation of amorphous carbon films deposited at reactive plasma conditions
Alexander Yoffe
Alexander Yoffe
,
Ilya Zon
Ilya Zon
,
Yishay Feldman
Yishay Feldman
and
Victor Shelukhin
Victor Shelukhin
| Aug 30, 2016
Materials Science-Poland
Volume 33 (2015): Issue 3 (September 2015)
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Published Online:
Aug 30, 2016
Page range:
606 - 611
Received:
Jan 13, 2014
Accepted:
May 31, 2015
DOI:
https://doi.org/10.1515/msp-2015-0088
Keywords
carbon deposition
,
reactive plasma
,
fluoridation
© 2016
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Alexander Yoffe
Weizmann Institute of Science, Rehovot, Israel 2Tel Aviv University, Tel Aviv, Israel
Ilya Zon
Weizmann Institute of Science, Rehovot, Israel
Yishay Feldman
Weizmann Institute of Science, Rehovot, Israel
Victor Shelukhin
Tel Aviv University, Tel Aviv, Israel