<abstract xmlns="http://www.w3.org/1999/xhtml"><p> The study presents a multi-scale microstructural characterization of three-dimensional (3-D) micro-textured surface of titanium nitride (TiN) thin films prepared by reactive DC magnetron sputtering in correlation with substrate temperature variation. Topographical characterization of the surfaces, obtained by atomic force microscopy (AFM) analysis, was realized by an innovative multifractal method which may be applied for AFM data. The surface micromorphology demonstrates that the multifractal geometry of TiN thin films can be characterized at nanometer scale by the generalized dimensions D<sub>q</sub> and the singularity spectrum f(α). Furthermore, to improve the 3-D surface characterization according with ISO 25178-2:2012, the most relevant 3-D surface roughness parameters were calculated. To quantify the 3-D nanostructure surface of TiN thin films a multifractal approach was developed and validated, which can be used for the characterization of topographical changes due to the substrate temperature variation.</p></abstract>

The study presents a multi-scale microstructural characterization of three-dimensional (3-D) micro-textured surface of titanium nitride (TiN) thin films prepared by reactive DC magnetron sputtering in correlation with substrate temperature variation. Topographical characterization of the surfaces, obtained by atomic force microscopy (AFM) analysis, was realized by an innovative multifractal method which may be applied for AFM data. The surface micromorphology demonstrates that the multifractal geometry of TiN thin films can be characterized at nanometer scale by the generalized dimensions Dq and the singularity spectrum f(α). Furthermore, to improve the 3-D surface characterization according with ISO 25178-2:2012, the most relevant 3-D surface roughness parameters were calculated. To quantify the 3-D nanostructure surface of TiN thin films a multifractal approach was developed and validated, which can be used for the characterization of topographical changes due to the substrate temperature variation.

Multifractal characteristics of titanium nitride thin films

Technical University of Cluj-Napoca, Faculty of Mechanical Engineering, Department of AET, Discipline of Descriptive Geometry and Engineering Graphics, 103 – 105 B-dul Muncii St., Cluj-Napoca 400641, Cluj, Romania

University of Silesia, Faculty of Computer Science and Materials Science, Institute of Informatics, Department of Biomedical Computer Systems, Będzińska 39, 41-205 Sosnowiec, Poland

Islamic Azad University, Plasma Physics Research Center, Science and Research Branch, P.O. Box 14665-678, Tehran, Iran

University of Craiova, Faculty of Mechanical Engineering, Department of Applied Mechanics, 165 Calea Bucureşti St., Craiova, 200585, Dolj, Romania

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

{"article-title":"Multifractal characteristics of titanium nitride thin films"}

The study presents a multi-scale microstructural characterization of three-dimensional (3-D) micro-textured surface of titanium nitride (TiN) thin films...

Multifractal characteristics of titanium nitride thin films

Published Online: Aug 30, 2016

Page range: 541 - 548

DOI: https://doi.org/10.1515/msp-2015-0086

Keywords
atomic force microscopy, DC magnetron sputtering, multifractal analysis, surface roughness, titanium nitride (TiN) thin film

© 2016

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Multifractal characteristics of titanium nitride thin films

Published Online: Aug 30, 2016

Page range: 541 - 548

DOI: https://doi.org/10.1515/msp-2015-0086

Keywordsatomic force microscopy, DC magnetron sputtering, multifractal analysis, surface roughness, titanium nitride (TiN) thin film

© 2016

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Keywords
atomic force microscopy, DC magnetron sputtering, multifractal analysis, surface roughness, titanium nitride (TiN) thin film