<abstract xmlns="http://www.w3.org/1999/xhtml"><p>Pulsed plasma in the impulse plasma deposition (IPD) synthesis is generated in a coaxial accelerator by strong periodic electrical pulses, and it is distributed in a form of energetic plasma packets. A nearly complete ionization of gas, in these conditions of plasma generation, favors the nucleation of new phase of ions and synthesis of metastable materials in a form of coatings which are characterized by amorphous and/or nanocrystalline structure. In this work, the Fe–Cu alloy, which is immiscible in the state of equilibrium, was selected as a model system to study the possibility of formation of a non-equilibrium phase during the IPD synthesis. Structural characterization of the layers was done by means of X-ray diffraction and conversion-electron Mössbauer spectroscopy. It was found that supersaturated solid solutions were created as a result of mixing and/or alloying effects between the layer components delivered to the substrate independently and separately in time. Therefore, the solubility in the Fe–Cu system was largely extended in relation to the equilibrium conditions, as described by the equilibrium phase diagram in the solid state.</p></abstract>

Pulsed plasma in the impulse plasma deposition (IPD) synthesis is generated in a coaxial accelerator by strong periodic electrical pulses, and it is distributed in a form of energetic plasma packets. A nearly complete ionization of gas, in these conditions of plasma generation, favors the nucleation of new phase of ions and synthesis of metastable materials in a form of coatings which are characterized by amorphous and/or nanocrystalline structure. In this work, the Fe–Cu alloy, which is immiscible in the state of equilibrium, was selected as a model system to study the possibility of formation of a non-equilibrium phase during the IPD synthesis. Structural characterization of the layers was done by means of X-ray diffraction and conversion-electron Mössbauer spectroscopy. It was found that supersaturated solid solutions were created as a result of mixing and/or alloying effects between the layer components delivered to the substrate independently and separately in time. Therefore, the solubility in the Fe–Cu system was largely extended in relation to the equilibrium conditions, as described by the equilibrium phase diagram in the solid state.

Synthesis of multicomponent metallic layers during impulse plasma deposition

Material Physics Department, National Centre for Nuclear Research

Faculty of Materials Science and Engineering

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

{"article-title":"Synthesis of multicomponent metallic layers during impulse plasma deposition"}

Pulsed plasma in the impulse plasma deposition (IPD) synthesis is generated in a coaxial accelerator by strong periodic electrical pulses, and it is...

Synthesis of multicomponent metallic layers during impulse plasma deposition

Published Online: Jan 06, 2016

Page range: 841 - 846

Received: Feb 23, 2015

Accepted: May 04, 2015

DOI: https://doi.org/10.1515/msp-2015-0077

Keywords
Fe–Cu alloy, metastable alloys, nanocrystalline films, physical vapor deposition (PVD), impulse plasma deposition (IPD)

© 2015 Katarzyna Nowakowska-Langier et al., published by De Gruyter Open

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Synthesis of multicomponent metallic layers during impulse plasma deposition

Published Online: Jan 06, 2016

Page range: 841 - 846

Received: Feb 23, 2015

Accepted: May 04, 2015

DOI: https://doi.org/10.1515/msp-2015-0077

KeywordsFe–Cu alloy, metastable alloys, nanocrystalline films, physical vapor deposition (PVD), impulse plasma deposition (IPD)

© 2015 Katarzyna Nowakowska-Langier et al., published by De Gruyter Open

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Keywords
Fe–Cu alloy, metastable alloys, nanocrystalline films, physical vapor deposition (PVD), impulse plasma deposition (IPD)