Surface micromorphology characterization of PDI8-CN2 thin films on H-Si by AFM analysis

Ştefan Ţălu 1 , Slawomir Kulesza 2 , Miroslaw Bramowicz 3 , Shahram Solaymani 4 , Mihai Ţălu 5 , Negin Beryani Nezafat 4 ,  and Sahar Rezaee 4
  • 1 Technical University of Cluj-Napoca, The Directorate of Research, Development and Innovation Management (DMCDI), Constantin Daicoviciu St., no. 15, Cluj-Napoca, 400020, Cluj county, Romania
  • 2 University of Warmia and Mazury in Olsztyn, Faculty of Technical Sciences, Oczapowskiego 11, 10-719, Olsztyn, Poland
  • 3 University of Warmia and Mazury in Olsztyn, Faculty of Technical Sciences, Oczapowskiego 11, 10-719, Olsztyn, Poland
  • 4 Department of Physics, Islamic Azad University, Iran, Kermanshah
  • 5 University of Craiova, Faculty of Mechanics, Department of Applied Mechanics and Civil Engineering, Calea Bucures, ti St., no. 107, 200512 Craiova, Dolj county, Romania

Abstract

A nanoscale investigation of three-dimensional (3-D) surface micromorphology of archetypical N, N0- bis (n-etyl) x:y, dicyanoperylene- 3, 4:9, 10 bis (dicarboximide) (PDI8-CN2) thin films on H-Si substrates, which are applicable in n-type semiconducting compounds, has been performed by using fractal analysis. In addition, surface texture characteristics of the PDI8-CN2 thin films have been characterized by using atomic force microscopy (AFM) operated in tapping-mode in the air. These analyses revealed that all samples can be described well as fractal structures at nanometer scale and their three dimensional surface texture could be implemented in both graphical models and computer simulations.

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