Influence of magnetron powering mode on various properties of TiO2 thin films

Open access

Abstract

In this paper, comparative studies on the structural, surface, optical, mechanical and corrosion properties of titanium dioxide (TiO2) thin films deposited by continuous and sequential magnetron sputtering processes were presented. In case of continuous process, magnetron was continuously supplied with voltage for 90 min. In turn, in sequential process, the voltage was supplied for 1 s alternately with 1 s break, therefore, the total time of the process was extended to 180 min. The TiO2 thin films were crack free, exhibited good adherence to the substrate and the surface morphology was homogeneous. Structural analysis showed that there were no major differences in the microstructure between coatings deposited in continuous and sequential processes. Both films exhibited nanocrystalline anatase structure with crystallite sizes of ca. 21 nm. Deposited coatings had high transparency in the visible wavelength range. Significant differences were observed in porosity (lower for sequential process), scratch resistance (better for sequential process), mechanical performance, i.e. hardness:elastic modulus ratio (higher for sequential process) and corrosion resistance (better for sequential process).

If the inline PDF is not rendering correctly, you can download the PDF file here.

  • [1] Bordji K. Jouzeau J.Y. Mainard D. Payan E. Netter P. Rie K.T. Stucky T. Hage-Ali M. Biomaterials 17 (1996) 929.

  • [2] Zhu X. Chen J. Scheideler L. Reichl R. Geisgesrstorfer J. Biomaterials 25 (2004) 4187.

  • [3] Neoh K.G. Hu X. Zheng D. Tang Kang E. Bio-materials 33 (2012) 2813.

  • [4] Wang Z.B. Hu H.X. Liu C.B. Zheng Y.G. Electrochim. Acta 135 (2014) 526.

  • [5] Carapeto A.P. Serro A.P. Nunes B.M.F. Martins M.C.L. Todorovic S. Duarte M.T. André V. Colaço R. Saramago B. Surf. Coat. Tech. 204 (2010) 3451.

  • [6] Ma G. Gong S. Lin G. Zhang L. Sun G. A. Appl. Surf. Sci. 258 (2012) 3045.

  • [7] Han Y. Hong S.H. Xu K.W. Surf. Coat. Tech. 154 (2002) 314.

  • [8] Huang P. Wang F. Xu K. Han Y. Surf. Coat. Tech. 201 (2007) 5168.

  • [9] Lange R. Lüthen F. Beck U. Rychly J. Baumann A. Nebe B. Biomol. Eng. 19 (2002) 255.

  • [10] Huang P. Xu K-W. Han Y. Mater. Lett. 59 (2005) 185.

  • [11] Kalisz M. Grobelny M. Ś Winiarski M. Mazur M. Wojcieszak D. Zdrojek M. Judek J. Domaradzki J. Kaczmarek D. Surf. Coat. Tech. 290 (2016) 124.

  • [12] Toma F-L. Bertrand G. Chwa S.O. Meunier C. Klein D. Coddet C. Surf. Coat. Tech. 200 (2006) 5855.

  • [13] Daoud W.A. Xin J.H. J. Sol-Gel Sci. Techn. 29 (2004) 25.

  • [14] Yoldas B.E. Appl. Opt. 19 (1980) 1425.

  • [15] Nasimento G.L.T. Seara L.M. Neves B.R.A. Mohallem N.D.S. Prog. Coll. Pol. Sci. 128 (2004) 227.

  • [16] Wojcieszak D. Mazur M. Indyka J. Jurkowska A. Kalisz M. Domanowski P. Kaczmarek D. Domaradzki J. Mater. Sci-Poland 33 (3) (2015) 660.

  • [17] Domaradzki J. Kaczmarek D. Prociow E.L. Borkowska A. Kudrawiec R. Misiewicz J. Schmeisser D. Beuckert G. Surf. Coat. Tech. 200 (2006) 6283.

  • [18] Twu M.J. Chiou A.H. Hu C.C. Hsu C.Y. Kuo C.G. Polym. Degrad. Stabil. 117 (2015) 1.

  • [19] Choi K.H. Duraisamy N. Muhammad N.M. Kim I. Choi H. Jo J. Appl. Phys. A 107 (2012) 715.

  • [20] Mazur M. Wojcieszak D. Kaczmarek D. Domaradzki J. Zatryb G. Misiewicz J. Morgiel J. Opt. Mater. 42 (2015) 423.

  • [21] Jouanny I. Labdi S. Aubert P. Buscema C. Maciejak O. Berger M.H. Guipont V. Jeandin M. Thin Solid Films 518 (2010) 3212.

  • [22] Zywitzki O. Modes T. Sahm H. Frach P. Goedicke K. Glos D. Surf. Coat. Tech. 180 – 181 (2004) 538.

  • [23] Bendavid A. Martin P.J. Takikawa H. Thin Solid Films 360 (2000) 241.

  • [24] Suda Y. Kawasaki H. Ueda T. Ohshima T. Thin Solid Films 453 – 454 (2004) 162.

  • [25] Klug H.P. Alexander E.E. X-ray diffraction procedures for polycrystalline and amorphous materials 2nd ed. John Wiley and Sons New York 1974.

  • [26] Mansfeld F. Electrochemical Methods of Corrosion Testing in CRAMER S.D. COVINO B.S. JR. (Eds.) Corrosion: Fundamentals Testing and Protection Vol. 13A. ASM Handbook ASM International 2003 pp. 446 – 462.

  • [27] Oliver W.C. Pharr G.M. J. Mater. Res. 7 (1992) 1564.

  • [28] Jung Y.-G. Lawn B.R. Martyniuk M. Huang H. Hu X.Z. J. Mater. Res. 19 (2004) 3076.

  • [29] Domaradzki J. Kaczmarek D. Prociow E. Wojcieszak D. Sieradzka K. Mazur M. Opt. Appl. 39 (4) (2009) 815.

  • [30] Wojcieszak D. Mazur M. Kaczmarek D. Morgiel J. Zatryb G. Domaradzki J. Misiewicz J. Opt. Mater. 48 (2015) 172.

  • [31] Mazur M. Wojcieszak D. Domaradzki J. Kaczmarek D. Poniedziałek A. Domanowski P. Mater. Res. Bull. 72 (2015) 116.

  • [32] Powder Diffraction File Joint Committee on Powder Diffraction Standards ASTM Philadelphia PA Card 21-1272 – PDF.

  • [33] Alhomoudi I.A. Newaz G. Thin Solid Films 517 (2009) 4372.

  • [34] Mazur M. Opt. Mater. 69 (2017) 96.

  • [35] Tauc J. Optical Properties of Solids Amsterdam North Holland 1970.

  • [36] Wicher B. Chodun R. Nowakowska-Langier K. Okrasa S. Trzciński M. Król K. Minikayev R. Skowroński Ł. KurpaskaŁ. Zdunek K. Appl. Surf. Sci. 456 (2018) 789.

  • [37] Billard A. Frantz C. Surf. Coat. Tech. 86 – 87 (1996) 722.

  • [38] Jung S.K. Lee S.H. Lee Y.S. Lee S.M. Park L.S. Sohn S.H. Mol. Cryst. Liq. Cryst. 499 (2009) 316.

  • [39] Kittel C. Solid State Physics John Wiley & Sons New York 1971.

  • [40] Heitmann W. Thin Solid Films 5 (1970) 61.

  • [41] Kermadi S. Agoudjil N. Sali S. Zougar L. Boumaour M. Broch L. Naciri A. Placido F. Spectrochim. Acta A 145 (2015) 145.

  • [42] Subramanian M. Vijayalakshmi S. Venkataraj S. Jayavel R. Thin Solid Films 516 (2008) 3776.

  • [43] Dave V. Dubey P. Gupta H.O. Chandra R. Thin Solid Films 549 (2013) 2.

  • [44] Bauer G. Ann. Phys.-Berlin 411 (4) (1934) 434.

  • [45] Mazur M. Howind T. Gibson D. Kaczmarek D. Song S. Wojcieszak D. Zhu W. Mazur P. Domaradzki J. Placido F. Mater. Design 85 (2015) 377.

  • [46] Chang L.C. Chang C.Y. Chen Y.I. Surf. Coat. Tech. 280 (2015) 27.

  • [47] Tsui T.Y. Pharr G.M. Oliver W.C. Bhatia C.S. White R.L. Anders S. Anders A. Brown I.G. Mat. Res. Soc. Symp. Proc. 383 (1995) 447.

  • [48] Sergueeva A.V. Stolyarov V.V. Valiev R.Z. Mukherjee A.K. Scripta Mater. 45 (2001) 747.

  • [49] Wang Y.M. Ott R.T. Buuren T.V. Willey T.M. Biener M.M. Hamza A.V. Phys. Rev. B 85 (2012) 014101.

  • [50] Lin J. Wang B. Sproul W.D. Ou Y. Dahan I. J. Phys. D Appl. Phys. 46 (2013) 084008.

  • [51] Chuang L.C. Luo C.H. Yang S. Appl. Surf. Sci. 258 (2011) 297.

  • [52] Duyar O. Placido F. Durusoy H.Z. J. Phys. D Appl. Phys. 41 (2008) 095307.

  • [53] Schmidt-Stein F. Thiemann S. Berger S. Hahn R. Schmuki P. Acta Mater. 58 (2010) 6317.

  • [54] Mayo M.J. Siegel R.W. Narayanasamy A. Nix W.D. J. Mater. Res. 5 (5) (1990) 1073.

Search
Journal information
Impact Factor

IMPACT FACTOR 2018: 0.918
5-year IMPACT FACTOR: 0.916

CiteScore 2018: 1.01

SCImago Journal Rank (SJR) 2018: 0.275
Source Normalized Impact per Paper (SNIP) 2018: 0.561

Metrics
All Time Past Year Past 30 Days
Abstract Views 0 0 0
Full Text Views 251 224 6
PDF Downloads 188 165 9