Effect of Oxygen Doping on the Structure of TiN Surface Coatings

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In the present work the influence of the level of oxygen doping on the structure of TiN films was investigated by dedicated experiments. The films were deposited at 400°C in an all metal UHV device by unbalanced magnetron sputtering at the same Ar and nitrogen flow rates, but the oxygen flow rate was changed in the experiments, incorporating oxygen in the range of 4 and 20 at.%. The structure of the films was investigated by XRD, Auger electron (AES) and X-ray photon electron (XPS) spectroscopy and transmission electron microscopy (TEM). The results discovered the crystal face anisotropy in the incorporation-segregation of oxygen leading to the change of the <111> texture to <002>. The structure analysis revealed that the <002> texture is developing also by competitive growth of crystals, which is the result of the limitation of the growth of the <111> oriented crystals by the TiO2 layer developing on their growth surface by the segregated oxygen species. The oxygen incorporating in the crystal lattice on the 002 crystal faces of the <002> oriented crystals is segregated by surface spinodal decomposition, developing nm sized 3D TiO-2 inclusion both in the bulk of the columns and the column boundaries.


  • [1] Makino, Y., et al., Characterization of Ti(NxOy) coatings produced by the arc ion plating method. Surface and Coatings Technology, 1998. 98(1-3): p. 934-938.

  • [2] Chan, M.-H. and F.-H. Lu, Preparation of titanium oxynitride thin films by reactive sputtering using air/Ar mixtures. Surface and Coatings Technology, 2008. 203(5-7): p. 614-618.

  • [3] Wu, Y., et al., Microstructure and mechanical properties of reactively sputtered Ti(O,N) coatings. International Journal of Refractory Metals and Hard Materials, 2008. 26(5): p. 461-464.

  • [4] Ehiasarian, A.P., et al., Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. Journal of Applied Physics, 2011. 109(10): p. 104314.

  • [5] Jakab-Farkas, L., S. Papp, and D. Biro. Effect of N Concentration on Microstructure Evolution of the Nanostructured (Al, Ti, Si)N Coatings Prepared by d.c. Reactive Magnetron Sputtering. in Proceedings of the 3rd International Conference Inter-Eng 2009, Interdisciplinarity in Engineering. 2009.

  • [6] Barna, Á., Topographic Kinetics and Practice of Low Angle Ion Beam Thinning. MRS Online Proceedings Library, 1991. 254: p. null-null.

  • [7] Barna, Á., B. Pécz, and M. Menyhard, TEM sample preparation by ion milling/amorphization. Micron, 1999. 30(3): p. 267-276.

  • [8] Labar, J.L., Electron Diffraction Based Analysis of Phase Fractions and Texture in Nanocrystalline Thin Films, Part II: Implementation. Microscopy and Microanalysis, 2009. 15(1): p. 20-29.

  • [9] Lábár, J.L., Consistent indexing of a (set of) single crystal SAED pattern(s) with the ProcessDiffraction program. Ultramicroscopy, 2005. 103(3): p. 237-249.

  • [10] Briggs, D. and P. Seah, Practical Surface Analysis, Auger and X-ray Photoelectron Spectroscopy. 1990: Wiley.

  • [11] Guillot, J., et al., Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS. Applied Surface Science, 2001. 177(4): p. 268-272.

  • [12] Barna, P.B. and M. Adamik, Fundamental structure forming phenomena of polycrystalline films and the structure zone models. Thin Solid Films, 1998. 317(1-2): p. 27-33.

  • [13] Petrov, I., et al., Microstructural evolution during film growth. Journal of Vacuum Science & Technology A, 2003. 21(5): p. S117-S128.

  • [14] Xiao, L., et al., Nanostructured TiN coating prepared by reactive plasma spraying in atmosphere. Applied Surface Science, 2007. 253(18): p. 7535-7539.

  • [15] Gubicza, J., et al., Influence of sintering temperature and pressure on crystallite size and lattice defect structure in nanocrystalline SiC. Journal of Materials Research, 2007. 22(05): p. 1314-1321.

  • [16] Hasaneen, M.F., et al., Substructure in the columnar crystals of the Ti0.45O0.20N0.35 oxynitride thin film. Vacuum, 2012. 86(12): p. 2105-2108.

  • [17] Barna, P.B. and G. Radnóczi, 3 - Structure formation during deposition of polycrystalline metallic thin films, in Metallic Films for Electronic, Optical and Magnetic Applications, K. Barmak and K. Coffey, Editors. 2014, Woodhead Publishing. p. 67-120.

MACRo 2015

Proceedings of the 5th International Conference on Recent Achievements in Mechatronics, Automation, Computer Sciences and Robotics

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