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Application of High Energy Absorbing Materials for Blast Protection

Application. Key Engineering Materials, 755. (2017) 286–291. [8] Karlos V., Solomos G.: Calculation of Blast Loads for Application to Structural Components . Publication Office of the European Union (2013) 1–49. [9] Figuli L., Jangl., Papán D.: Modelling and Testing of Blast Effect On the Structures . IOP Conf. Series: Earth and Environmental Science 44. (2016). [10] Bezzeg A., Végh Á

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The effects of sintering temperature and poling condition on the piezoelectric properties of 0.935(Bi0.5Na0.5)TiO3 - 0.065BaTiO3 ceramics

[1] JAFFE B., COOK W.R., JAFFE H., Piezoelectric Ceramics, Academic Press, London 1971. [2] LEVASSORT F., TRAN-HUU-HUE P., RINGAARD E., LETHIECQ M., J. Eur. Ceram. Soc., 21(2001),1361. [3] Directive 2002/95/EC of European parliament and of the council of 27 January 2003 on restriction of the use of certain hazardous substances in electrical and electronic equipment. Official journal of the European Union. [4

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Nanoalumina obtained by pyrosol method

[1] Davis K., Material Review: Alumina (Al2O3), School of Doctoral Studies (European Union) Journal, 2010 [2] Piconi C. Maccauro G., Muratori F., Brach Del Prever E., J. Appl. Biomater. Biomech., 1(1), (2003), 19. [3] Granado S., Ragel V., J. Mater. Chem., 7(8), (1997), 1581. [4] Li Ji-guang, Sun Xu-dong, Zhang Min, Li Xiaodong, Ru Hong-qiang, Journal of Inorganic Materials, 6, (1998). [5] Duminica F

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Thermodynamic properties of Al in ternary lead-free solder Al-Sn-Zn alloys

.), The minerals, metals and materials society, Orlando, 1997, p. 65. [5] GNECCO F., RICCI E., AMORE S., GUIRANNO D., BORZONE G., ZANICCHI G., NOVAKOVIC R., Int. J. Adhes. Adhes., 27 (5) (2007), 409. [6] KNOTT S., MIKULA A., Mater. Trans., 43 (8) (2002), 1868. [7] LIU X.J., YAMAKI T., OHNUMA I., KAINUMA R., ISHIDA K., Mater. Trans., 45 (3) (2004) 637. [8] Official Journal of the European Union, L37 (2003), 19. [9] LAURILA V., VUORINEN V., KIVILAHTI J.K., Mater. Sci. Eng. R, 49 (1 - 2) (2005

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Investigation of optical properties of silicon oxynitride films deposited by RF PECVD method

successfully used for optoelectronic and photonic applications such as antireflective coatings, optical filters or waveguide layers. The future works will concern the application of silicon dioxide, silicon nitride and silicon oxynitride in the technology of micro- and optoelectronic structures (Bragg reflectors, optical filters and antireflective layers for photovoltaic cells, LEDs and photodetectors). Acknowledgements This work was co-financed by the European Union within European Regional Development Fund, through grant Innovative Economy (P0IG.01

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Scanning capacitance microscopy characterization of AIIIBV epitaxial layers

applied and the valuable information about the exact position of the junction can be quickly obtained. Acknowledgements This work was co-financed by the European Union within the European Regional Development Fund, through grant Innovative Economy (POIG.01.01.02-00-008/08-05), by the National Centre for Research and Development through the Applied Research Program Grant No. 178782, the National Centre for Research and Development through the Program LIDER, Grant No. LIDER/027/533/L-533/L-5/13/NCBR/2014 and under the projects:No. PBS1/B3/2/2012 “EDEN” and No. PBS2

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Epitaxial regrowth of InP/InGaAs heterostructure on patterned, nonplanar substrates

-funded by the European Union from the funds of the European Regional Development Fund under the Infrastructure and Environment Program No UDA-POIS.13.01-021/09-00 is greatly acknowledged for SEM maps. References [1] Tanbun-Ek T., Logan R.A., Temkin H., Olsson N.A., Sergent A.M., Wecht K.W., IEEE Photonics Tech. L ., 7 (1988), 453. Tanbun-Ek T. Logan R.A. Temkin H. Olsson N.A. Sergent A.M. Wecht K.W. IEEE Photonics Tech. L 7 1988 453 [2] Turco F.S., Tamargo M.C., Hweng D.M., Nahory R.E., Werner J., Kash K., Kapon E., Appl. Phys. Lett ., 56 (1990), 72. 10

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Effect of annealing temperature on optical and electrical properties of metallophthalocyanine thin films deposited on silicon substrate

annealing process affects the structural organization and homogeneity of organic thin layers. A better description of electrical parameters connected with the orientation and polymorphic form of organic thin layers requires further studies which will be carried out in future. Acknowledgements The Project was supported through the European Union - European Social Fund and Human Capital - National Cohesion Strategy (RS) and in part by the Research Project of Poznan University of Technology 06/65/DSPB/0516. References [1] Simon J., Andre J.J., Molecular

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