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Effect of Oxygen Doping on the Structure of TiN Surface Coatings

Materials, 2008. 26(5): p. 461-464. [4] Ehiasarian, A.P., et al., Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films. Journal of Applied Physics, 2011. 109(10): p. 104314. [5] Jakab-Farkas, L., S. Papp, and D. Biro. Effect of N Concentration on Microstructure Evolution of the Nanostructured (Al, Ti, Si)N Coatings Prepared by d.c. Reactive Magnetron Sputtering. in Proceedings of the 3rd International Conference Inter-Eng 2009, Interdisciplinarity in Engineering. 2009

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