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  • Author: Izabela Stępinska x
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Izabela Stępińska, Elżbieta Czerwosz, Mirosław Kozłowski, Halina Wronka and Piotr Dłużewski

Abstract

Field emission from materials at high electric fields can be associated with unfavorable or even destructive effect on the surface of the investigated cathode. The impact of high voltage electric power supply causes locally very strong electric fields focusing on the cathode surface. It causes a number of phenomena, which can adversely affect the morphology and the structure of the cathode material. Such a phenomenon is, for example, peeling of an emissive layer from the substrate or its burnout. It results in tearing of the layer and a decrease or loss of its ability to electrons emission. The cold cathodes in a form of CNT films with various CNTs superficial distribution are obtained by physical vapor deposition followed by chemical vapor deposition. CNTs are catalyzed in pyrolytic process with xylene (CVD), by Ni in a form of nanograins (few nm in size) placed in carbonaceous matrix. These films are built of emissive CNTs - carbonaceous film deposited on different substrates. In this work, the morphology and topography of superficial changes resulting from external electric field in such films were investigated.

Open access

Izabela Stępinska, Mirosław Kozłowski, Joanna Radomska, Halina Wronka, Elżbieta Czerwosz and Kamil Sobczak

Abstract

In this paper various types of films made of carbon nanotubes (CNTs) are presented. These films were prepared on different substrates (Al2O3, Si n-type) by the two-step method. The two-step method consists of physical vapor deposition step, followed by chemical vapor deposition step (PVD/CVD). Parameters of PVD process were the same for all initial films, while the duration times of the second step - the CVD process, were different (15, 30 min.). Prepared films were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and field emission (FE) measurements. The I-E and F-N characteristics of electron emission were discussed in terms of various forms of CNT films. The value of threshold electric field ranged from few V/μm (for CNT dispersed rarely on the surface of the film deposited on Si) up to ~20 V/μm (for Al2O3 substrate).