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M. Mazur, J. Domaradzki and D. Wojcieszak

Abstract

In this paper, the influence of vanadium doping on optical and electrical properties of titanium dioxide thin films has been discussed. The (Ti-V)Ox thin films was deposited on silicon and Corning glass substrates using high energy reactive magnetron sputtering process. Measurements performed with the aid of x-ray diffraction revealed, that deposited thin film was composed of nanocrystalline mixture of TiO2-anatase, V2O3 and β-V2O5 phases. The amount of vanadium in the thin film, estimated on the basis of energy dispersive spectroscopy measurement, was equal to 3 at. %. Optical properties were evaluated based on transmission and reflection measurements. (Ti-V)Ox thin film was well transparent and the absorption edge was shifted by only 11 nm towards longer wavelengths in comparison to undoped TiO2. Electrical measurements revealed, that investigated thin film was transparent oxide semiconductors with n-type electrical conduction and resistivity of about 2.7 · 105 Ωcm at room temperature. Additionally, measured I-V characteristics of TOS-Si heterostructure were nonlinear and asymmetrical.

Open access

J. Domaradzki, D. Kaczmarek, M. Mazur, D. Wojcieszak, J. Halarewicz, S. Glodek and P. Domanowski

Abstract

The paper presents results of optical and surface morphology investigations of semitransparent silver single thin films deposited on glass substrate in relation to their heat radiation treatment. The thickness of 15 nm for the silver thin films was selected using computer designing of optical spectra and the films were deposited using electron beam evaporation process. Optical transmission and reflection were investigated for as deposited samples and after exposition to heat radiation from quartz-halogen lamp. The changes in the optical spectra were observed which suggested degradation of deposited heat mirrors. Structure and surface morphology studies performed using scanning electron microscopy, X-ray photoelectron spectroscopy and atomic force microscopy allowed us to conclude about formation of nanometric silver islands, regularly distributed over the surface of the glass substrate after exposure to heat treatment.

Open access

M. Mazur, K. Sieradzka, D. Kaczmarek, J. Domaradzki, D. Wojcieszak and P. Domanowski

Abstract

In this paper investigations of structural and optical properties of nanocrystalline Ti-V oxide thin films are described. The films were deposited onto Corning 7059 glass using a modified reactive magnetron sputtering method. Structural investigations of prepared Ti-V oxides with vanadium addition of 19 at. % revealed amorphous structure, while incorporation of 21 and 23 at. % of vanadium resulted in V2O5 formation with crystallites sizes of 12.7 and 32.4 nm, respectively. All prepared thin films belong to transparent oxide semiconductors due to their high transmission level of ca. 60–75 % in the visible light range, and resistivity in the range of 3.3·102–1.4·105 Ωcm. Additionally, wettability and hardness tests were performed in order to evaluate the usefulness of the films for functional coatings.